We analyze surface texturing induced by femtosecond laser irradiation of a silicon target at high repetition rates. The features of the produced surface structures in ablative conditions, i.e. at fluences larger than the ablation threshold, are investigated as a function of number of pulses and pulse energy, for various repetition rates, in the range 10 Hz–200 kHz. Our experimental findings highlight a significant influence of the pulse repetition rate on both surface texture and crater size produced by irradiation with a fixed sequence of N laser pulses. This effect is ascribed to plume shielding occurring at repetition rates larger than ≈10 kHz.
Plume shielding effects in ultrafast laser surface texturing of silicon at high repetition rate in air / Allahyari, E.; JJ Nivas, J.; Valadan, M.; Fittipaldi, R.; Vecchione, A.; Parlato, L.; Bruzzese, R.; Altucci, C.; Amoruso, S.. - In: APPLIED SURFACE SCIENCE. - ISSN 0169-4332. - 488:(2019), pp. 128-133. [10.1016/j.apsusc.2019.05.219]
Plume shielding effects in ultrafast laser surface texturing of silicon at high repetition rate in air
Allahyari E.;JJ Nivas J.;Valadan M.;Parlato L.;Bruzzese R.;Altucci C.;Amoruso S.
2019
Abstract
We analyze surface texturing induced by femtosecond laser irradiation of a silicon target at high repetition rates. The features of the produced surface structures in ablative conditions, i.e. at fluences larger than the ablation threshold, are investigated as a function of number of pulses and pulse energy, for various repetition rates, in the range 10 Hz–200 kHz. Our experimental findings highlight a significant influence of the pulse repetition rate on both surface texture and crater size produced by irradiation with a fixed sequence of N laser pulses. This effect is ascribed to plume shielding occurring at repetition rates larger than ≈10 kHz.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.