Growth-Etching Competitive Mechanism Governing The Structure And Chemical Composition Of Plasma Deposited Silicon-Based Materials / Ambrosone, Giuseppina; G., Bruno; P., Capezzuto; G., Cicala; Coscia, Ubaldo. - In: PHILOSOPHICAL MAGAZINE. B. PHYSICS OF CONDENSED MATTER. STATISTICAL MECHANICS, ELECTRONIC, OPTICAL AND MAGNETIC PROPERTIES. - ISSN 1364-2812. - STAMPA. - 80:(2000), pp. 487-496. [10.1080/014186300255131]

Growth-Etching Competitive Mechanism Governing The Structure And Chemical Composition Of Plasma Deposited Silicon-Based Materials

AMBROSONE, GIUSEPPINA;COSCIA, UBALDO
2000

2000
Growth-Etching Competitive Mechanism Governing The Structure And Chemical Composition Of Plasma Deposited Silicon-Based Materials / Ambrosone, Giuseppina; G., Bruno; P., Capezzuto; G., Cicala; Coscia, Ubaldo. - In: PHILOSOPHICAL MAGAZINE. B. PHYSICS OF CONDENSED MATTER. STATISTICAL MECHANICS, ELECTRONIC, OPTICAL AND MAGNETIC PROPERTIES. - ISSN 1364-2812. - STAMPA. - 80:(2000), pp. 487-496. [10.1080/014186300255131]
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11588/149114
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 4
  • ???jsp.display-item.citation.isi??? 5
social impact