In this work we report on the properties of the ablation plume and the characteristics of the films produced by ultra-fast pulsed laser deposition (PLD) of TiO2 in vacuum. Ablation was induced by using pulses with a duration of ≈300 fs at 527 nm.We discuss both the composition and the expansion dynamics of the TiO2 plasma plume, measured by exploiting time- and space-resolved emission spectroscopy and gated imaging. The properties of the TiO2 nanoparticles and nanoparticle-assembled films were characterized using different techniques, i.e. environmental scanning electron microscopy (ESEM), atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). It is suggested that most of thematerial decomposes in the form of nanoparticles.

Ultra-fast laser ablation and deposition of TiO2 / M., Sanz; M., Castillejo; Amoruso, Salvatore; Ausanio, Giovanni; Bruzzese, Riccardo; X., Wang. - In: APPLIED PHYSICS. A, MATERIALS SCIENCE & PROCESSING. - ISSN 0947-8396. - STAMPA. - 101:(2010), pp. 639-644. [10.1007/s00339-010-5916-5]

Ultra-fast laser ablation and deposition of TiO2

AMORUSO, SALVATORE;AUSANIO, GIOVANNI;BRUZZESE, RICCARDO;
2010

Abstract

In this work we report on the properties of the ablation plume and the characteristics of the films produced by ultra-fast pulsed laser deposition (PLD) of TiO2 in vacuum. Ablation was induced by using pulses with a duration of ≈300 fs at 527 nm.We discuss both the composition and the expansion dynamics of the TiO2 plasma plume, measured by exploiting time- and space-resolved emission spectroscopy and gated imaging. The properties of the TiO2 nanoparticles and nanoparticle-assembled films were characterized using different techniques, i.e. environmental scanning electron microscopy (ESEM), atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). It is suggested that most of thematerial decomposes in the form of nanoparticles.
2010
Ultra-fast laser ablation and deposition of TiO2 / M., Sanz; M., Castillejo; Amoruso, Salvatore; Ausanio, Giovanni; Bruzzese, Riccardo; X., Wang. - In: APPLIED PHYSICS. A, MATERIALS SCIENCE & PROCESSING. - ISSN 0947-8396. - STAMPA. - 101:(2010), pp. 639-644. [10.1007/s00339-010-5916-5]
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11588/373868
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